The Kurt Lesker Lab-line E-beam evaporation equipment imported from the United States can continuously deposit 6 kinds of metal materials in a single step process.
The background pressure of the cavity can reach 2E-8 Torr, the evaporation rate is 0.1A/s～10A/s; the film thickness uniformity is ±2%. It can be adjusted according to different material characteristics. Special jigs can be used to process substrates of non-standard sizes.
Electron beam evaporation equipment is mainly used for vapor deposition of Ti, Pt, Au, Ni, Al, Pd, Ge, Cr and other metal materials. The vapor deposition speed is adjustable and stable, and can be applied to the lift-off process.
Liftoff metal graphics
Glass substrate optics coating